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Low-temperature pre-epitaxy surface cleaning of Si and SiGe

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dc.contributor.authorProfijt, Harald
dc.contributor.authorSuhard, Samuel
dc.contributor.authorRosseel, Erik
dc.contributor.authorTolle, John
dc.contributor.authorMertens, Hans
dc.contributor.authorDhayalan, Sathish Kumar
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorWeeks, Doran
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorLoo, Roger
dc.contributor.authorMehta, Sandeep
dc.contributor.authorMaes, Jan
dc.contributor.imecauthorSuhard, Samuel
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorMaes, Jan
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-22T21:56:38Z
dc.date.available2021-10-22T21:56:38Z
dc.date.issued2015-05
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25776
dc.source.beginpage143
dc.source.conference9th International Conference on Silicon Epitaxy and Heterostructures - ICSI9
dc.source.conferencedate17/05/2015
dc.source.conferencelocationMontreal Canada
dc.source.endpage144
dc.title

Low-temperature pre-epitaxy surface cleaning of Si and SiGe

dc.typeMeeting abstract
dspace.entity.typePublication
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