Publication:

Stress in Silicon-Germanium Nanowires: Layout Dependence and Imperfect Source/Drain Epitaxial Stressors

Date

2021
Journal article
https://doi.org/10.1109/TED.2021.3076754
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dc.contributor.authorEneman, Geert
dc.contributor.authorVeloso, Anabela
dc.contributor.authorFavia, Paola
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorPorret, Clément
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorLoo, Roger
dc.contributor.authorSpessot, Alessio
dc.contributor.authorMatagne, Philippe
dc.contributor.authorRyckaert, Julien
dc.contributor.authorHoriguchi, Naoto
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorSpessot, Alessio
dc.contributor.imecauthorMatagne, Philippe
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecPorret, Clement::0000-0002-4561-348X
dc.contributor.orcidimecArimura, Hiroaki::0000-0002-3138-708X
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecSpessot, Alessio::0000-0003-2381-0121
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.date.accessioned2022-02-21T13:29:32Z
dc.date.available2022-02-21T13:29:32Z
dc.date.issued2021
dc.identifier.doi10.1109/TED.2021.3076754
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38946
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
dc.source.beginpage5380
dc.source.endpage5385
dc.source.issue11
dc.source.journalIEEE TRANSACTIONS ON ELECTRON DEVICES
dc.source.numberofpages6
dc.source.volume68
dc.title

Stress in Silicon-Germanium Nanowires: Layout Dependence and Imperfect Source/Drain Epitaxial Stressors

dc.typeJournal article
dspace.entity.typePublication
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