Publication:
High NA EUV defectivity inspection: overview and challenges
| dc.contributor.author | Beral, Christophe | |
| dc.contributor.author | Van Den Heuvel, Dieter | |
| dc.contributor.author | Beggiato, Matteo | |
| dc.contributor.author | Chowrira Poovanna, Bhavishya | |
| dc.contributor.author | Paolillo, Sara | |
| dc.contributor.author | Moussa, Alain | |
| dc.contributor.author | Foubert, Philippe | |
| dc.contributor.author | Cerbu, Dorin | |
| dc.contributor.author | Demaude, Annaëlle | |
| dc.contributor.author | Leray, Philippe | |
| dc.contributor.author | Charley, Anne-Laure | |
| dc.contributor.imecauthor | Beral, C. | |
| dc.contributor.imecauthor | Van den Heuvel, D. | |
| dc.contributor.imecauthor | Beggiato, M. | |
| dc.contributor.imecauthor | Chowrira, B. | |
| dc.contributor.imecauthor | Paolillo, S. | |
| dc.contributor.imecauthor | Moussa, A. | |
| dc.contributor.imecauthor | Foubert, P. | |
| dc.contributor.imecauthor | Cerbu, D. | |
| dc.contributor.imecauthor | Demaude, A. | |
| dc.contributor.imecauthor | Leray, P. | |
| dc.contributor.imecauthor | Charley, A. L. | |
| dc.date.accessioned | 2025-07-28T03:57:28Z | |
| dc.date.available | 2025-07-28T03:57:28Z | |
| dc.date.issued | 2025 | |
| dc.description.wosFundingText | This work has been enabled in part by the NanoIC pilot line. The acquisition and operation are jointly funded by the Chips Joint Undertaking, through the European Union's Digital Europe (101183266) and Horizon Europe programs (101183277), as well as by the participating states Belgium (Flanders), France, Germany, Finland, Ireland and Romania. For more information, visit nanoic-project.eu. | |
| dc.identifier.doi | 10.1117/12.3051293 | |
| dc.identifier.eisbn | 978-1-5106-8639-7 | |
| dc.identifier.isbn | 978-1-5106-8638-0 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45954 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 134261H-1 | |
| dc.source.conference | 2025 Conference on Metrology Inspection and Process Control-Annual | |
| dc.source.conferencedate | 2025-02-24 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.endpage | 134261H-9 | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 9 | |
| dc.title | High NA EUV defectivity inspection: overview and challenges | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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