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Conference contributions
Modification of 193-nm photoresist by UV irradiation for post-etch wet strip applications
Publication:
Modification of 193-nm photoresist by UV irradiation for post-etch wet strip applications
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Date
2009
Meeting abstract
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17956.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kesters, Els
;
Le, Quoc Toan
;
Lux, Marcel
;
Prager, Lutz
;
Vereecke, Guy
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Abstract
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1942
since deposited on 2021-10-17
Acq. date: 2025-12-11
Citations
Metrics
Views
1942
since deposited on 2021-10-17
Acq. date: 2025-12-11
Citations