Publication:

Modification of 193-nm photoresist by UV irradiation for post-etch wet strip applications

Date

2009
Meeting abstract
Simple item page Full metadata Statistics
 
dc.contributor.authorKesters, Els
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorLux, Marcel
dc.contributor.authorPrager, Lutz
dc.contributor.authorVereecke, Guy
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorVereecke, Guy
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-17T23:25:15Z
dc.date.available2021-10-17T23:25:15Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15590
dc.source.conference2nd International Plasma Etch and Strip in Microelectronics Workshop - PESM
dc.source.conferencedate26/02/2009
dc.source.conferencelocationLeuven Belgium
dc.title

Modification of 193-nm photoresist by UV irradiation for post-etch wet strip applications

dc.typeMeeting abstract
dspace.entity.typePublication
Files

Original bundle

Name:
17956.pdf
Size:
63.47 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions