Publication:

Dopant segregation and diffusion in CVD epitaxial Grown Ge

Date

2017
Meeting abstract
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dc.contributor.authorMurota, Junichi
dc.contributor.authorYamamoto, Yuchi
dc.contributor.authorCostina, Ioan
dc.contributor.authorBaerwolf, Florian
dc.contributor.authorTillack, Bernd
dc.contributor.authorLe Thanh, Vinh
dc.contributor.authorLoo, Roger
dc.contributor.authorDouhard, Bastien
dc.contributor.authorAyyad, Mustafa
dc.contributor.authorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorAyyad, Mustafa
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-24T09:48:36Z
dc.date.available2021-10-24T09:48:36Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29041
dc.source.conference6th International Workshop on Nanotechnology and Application - IWNA
dc.source.conferencedate8/11/2017
dc.source.conferencelocationPhan Thiet Vietnam
dc.title

Dopant segregation and diffusion in CVD epitaxial Grown Ge

dc.typeMeeting abstract
dspace.entity.typePublication
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