Feasability demonstration of 0.18 µm and 0.13 µm optical projection lithography based on CD control calculations

cris.virtual.department	#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid	0000-0003-0803-4267
cris.virtualsource.department	987ea135-86ab-40b5-a86e-f94391ccf5fe
cris.virtualsource.orcid	987ea135-86ab-40b5-a86e-f94391ccf5fe
dc.contributor.author	Kim, Kee - Ho
dc.contributor.author	Ronse, Kurt
dc.contributor.author	Yen, Anthony
dc.contributor.author	Van den hove, Luc
dc.contributor.imecauthor	Ronse, Kurt
dc.contributor.imecauthor	Van den hove, Luc
dc.contributor.orcidimec	Ronse, Kurt::0000-0003-0803-4267
dc.date.accessioned	2021-09-29T14:38:23Z
dc.date.available	2021-09-29T14:38:23Z
dc.date.embargo	9999-12-31
dc.date.issued	1996
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/1293
dc.source.beginpage	186
dc.source.conference	Symposium on VLSI Technology. Digest of Technical Papers
dc.source.conferencedate	11/06/1996
dc.source.conferencelocation	Honolulu, HI USA
dc.source.endpage	187
dc.title	Feasability demonstration of 0.18 µm and 0.13 µm optical projection lithography based on CD control calculations
dc.type	Proceedings paper
dspace.entity.type	Publication
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