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High-index immersion fluids enabling cost-effective single-exposure lithography for 32nm half pitches
Publication:
High-index immersion fluids enabling cost-effective single-exposure lithography for 32nm half pitches
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Date
2008
Proceedings Paper
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16313.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
French, Roger H.
;
Tran, Hoang V.
;
Adelman, Doug J.
;
Rogado, Nyrissa S.
;
Kaku, Mureo
;
Mocella, Michael
;
Chen, Charles Y.
;
Hendrickx, Eric
;
Van Roey, Frieda
;
Bernfeld, Adam S.
;
Derryberry, Rebekah A.
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1876
since deposited on 2021-10-17
Acq. date: 2025-12-15
Citations
Metrics
Views
1876
since deposited on 2021-10-17
Acq. date: 2025-12-15
Citations