Publication:

High-index immersion fluids enabling cost-effective single-exposure lithography for 32nm half pitches

Date

2008
Proceedings Paper
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dc.contributor.authorFrench, Roger H.
dc.contributor.authorTran, Hoang V.
dc.contributor.authorAdelman, Doug J.
dc.contributor.authorRogado, Nyrissa S.
dc.contributor.authorKaku, Mureo
dc.contributor.authorMocella, Michael
dc.contributor.authorChen, Charles Y.
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorBernfeld, Adam S.
dc.contributor.authorDerryberry, Rebekah A.
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVan Roey, Frieda
dc.date.accessioned2021-10-17T07:09:22Z
dc.date.available2021-10-17T07:09:22Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13739
dc.source.beginpage692417
dc.source.conferenceOptical Microlithography XXI
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
dc.title

High-index immersion fluids enabling cost-effective single-exposure lithography for 32nm half pitches

dc.typeProceedings paper
dspace.entity.typePublication
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