Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20-450 eV
Publication:
Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20-450 eV
Copy permalink
Date
2023
Journal article
https://doi.org/10.1021/acsami.3c05884
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
Published version
2.73 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Fallica, Roberto
;
Mahne, Nicola
;
Conard, Thierry
;
Vanleenhove, Anja
;
de Simone, Danilo
;
Nannarone, Stefano
Journal
ACS APPLIED MATERIALS & INTERFACES
Abstract
Description
Metrics
Downloads
3
since deposited on 2024-01-23
Acq. date: 2026-01-11
Views
991
since deposited on 2024-01-23
2
last month
Acq. date: 2026-01-11
Citations
Metrics
Downloads
3
since deposited on 2024-01-23
Acq. date: 2026-01-11
Views
991
since deposited on 2024-01-23
2
last month
Acq. date: 2026-01-11
Citations