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Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20-450 eV
Publication:
Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20-450 eV
Date
2023
Journal article
https://doi.org/10.1021/acsami.3c05884
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Fallica, Roberto
;
Mahne, Nicola
;
Conard, Thierry
;
Vanleenhove, Anja
;
de Simone, Danilo
;
Nannarone, Stefano
Journal
ACS APPLIED MATERIALS & INTERFACES
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3
since deposited on 2024-01-23
Acq. date: 2025-10-28
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987
since deposited on 2024-01-23
Acq. date: 2025-10-28
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Downloads
3
since deposited on 2024-01-23
Acq. date: 2025-10-28
Views
987
since deposited on 2024-01-23
Acq. date: 2025-10-28
Citations