Publication:

Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20-450 eV

Date

2023
Journal article
https://doi.org/10.1021/acsami.3c05884
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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0003-4523-9624
cris.virtual.orcid0000-0002-4298-5851
cris.virtualsource.departmentfeed31a7-95f4-46e2-b373-180a042de8af
cris.virtualsource.department6bca2580-fe8c-4b07-87e1-c34fbfbb75ce
cris.virtualsource.orcidfeed31a7-95f4-46e2-b373-180a042de8af
cris.virtualsource.orcid6bca2580-fe8c-4b07-87e1-c34fbfbb75ce
dc.contributor.authorFallica, Roberto
dc.contributor.authorMahne, Nicola
dc.contributor.authorConard, Thierry
dc.contributor.authorVanleenhove, Anja
dc.contributor.authorde Simone, Danilo
dc.contributor.authorNannarone, Stefano
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVanleenhove, Anja
dc.contributor.imecauthorde Simone, Danilo
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVanleenhove, Anja::0000-0001-5481-9642
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2024-01-23T11:01:57Z
dc.date.available2024-01-23T11:01:57Z
dc.date.embargo9999-12-31
dc.date.issued2023
dc.identifier.doi10.1021/acsami.3c05884
dc.identifier.issn1944-8244
dc.identifier.pmidMEDLINE:37449783
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43443
dc.publisherAMER CHEMICAL SOC
dc.source.beginpage35483
dc.source.endpage35494
dc.source.issue29
dc.source.journalACS APPLIED MATERIALS & INTERFACES
dc.source.numberofpages12
dc.source.volume15
dc.subject.keywordsSECONDARY ELECTRONS
dc.subject.keywordsTRANSMISSION
dc.subject.keywordsSCATTERING
dc.subject.keywordsSOLIDS
dc.title

Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20-450 eV

dc.typeJournal article
dspace.entity.typePublication
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