Publication:

Selectivity Enhancement for Ruthenium Atomic Layer Deposition in Sub-50 nm Nanopatterns by Diffusion and Size-Dependent Reactivity

Date

2021-08-11
Journal article
https://doi.org/10.1002/admi.202100846
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dc.contributor.authorGrillo, Fabio
dc.contributor.authorVan Ommen, Ruud
dc.contributor.authorClerix, Jan-Willem
dc.contributor.authorMarques, Esteban
dc.contributor.authorSoethoudt, Job
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorDelabie, Annelies
dc.contributor.imecauthorClerix, Jan-Willem
dc.contributor.imecauthorMarques, Esteban
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidextVan Ommen, J. Ruud::0000-0001-7884-0323
dc.contributor.orcidextGrillo, Fabio::0000-0003-1486-3117
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecDelabie, Annelies::0000-0001-9739-7419
dc.contributor.orcidimecSoethoudt, Job::0000-0002-3245-5830
dc.contributor.orcidimecClerix, Jan-Willem::0000-0002-2681-4569
dc.date.accessioned2022-06-24T08:05:49Z
dc.date.available2021-11-02T15:56:56Z
dc.date.available2022-05-16T09:30:27Z
dc.date.available2022-06-02T13:01:02Z
dc.date.available2022-06-24T08:05:49Z
dc.date.embargo2022-10-22
dc.date.issued2021-08-11
dc.identifier.doi10.1002/admi.202100846
dc.identifier.issn2196-7350
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37558
dc.publisherWILEY
dc.source.beginpage2100846
dc.source.issue20
dc.source.journalADVANCED MATERIALS INTERFACES
dc.source.numberofpages10
dc.source.volume8
dc.subject.disciplineAtomic, molecular & chemical physics
dc.subject.keywordsCHEMICAL-VAPOR-DEPOSITION
dc.subject.keywordsEPITAXIAL-GROWTH
dc.subject.keywordsNUCLEATION
dc.subject.keywordsArea-selective deposition
dc.subject.keywordsruthenium
dc.title

Selectivity Enhancement for Ruthenium Atomic Layer Deposition in Sub-50 nm Nanopatterns by Diffusion and Size-Dependent Reactivity

dc.typeJournal article
dspace.entity.typePublication
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