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Multi-gate devices for the 32nm technology node and beyond: challenges for selective epitaxial growth
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Multi-gate devices for the 32nm technology node and beyond: challenges for selective epitaxial growth
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Date
2008
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Collaert, Nadine
;
Rooyackers, Rita
;
Hikavyy, Andriy
;
Dixit, Abhisek
;
Leys, Frederik
;
Verheyen, Peter
;
Loo, Roger
;
Jurczak, Gosia
;
Biesemans, Serge
Journal
Thin Solid Films
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1882
since deposited on 2021-10-17
Acq. date: 2025-12-15
Citations
Metrics
Views
1882
since deposited on 2021-10-17
Acq. date: 2025-12-15
Citations