Observation and characterization of defects in HfO2 high-k gate dielectric layers

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Author(s)

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Delabie, Annelies

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Van Elshocht, Sven

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Richard, Olivier

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Witters, Thomas

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De Gendt, Stefan

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Journal

Microelectronics Reliability

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1977 since deposited on 2021-10-16

Acq. date: 2025-12-08