Publication:
Patterning of 25nm contact holes at 90nm pitch: combination of L/S double exposure immersion lithography and plasma-assisted shrink technology
Date
| dc.contributor.author | de Marneffe, Jean-Francois | |
| dc.contributor.author | Lazzarino, Frederic | |
| dc.contributor.author | Johansson, Henrik | |
| dc.contributor.author | Truffert, Vincent | |
| dc.contributor.author | Boullart, Werner | |
| dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
| dc.contributor.imecauthor | Lazzarino, Frederic | |
| dc.contributor.imecauthor | Truffert, Vincent | |
| dc.contributor.imecauthor | Boullart, Werner | |
| dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
| dc.contributor.orcidimec | Truffert, Vincent::0000-0001-7851-830X | |
| dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
| dc.date.accessioned | 2021-10-18T15:49:37Z | |
| dc.date.available | 2021-10-18T15:49:37Z | |
| dc.date.issued | 2010 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16953 | |
| dc.source.conference | Gaseous Electronics Conference - GEC | |
| dc.source.conferencedate | 4/10/2010 | |
| dc.source.conferencelocation | Paris France | |
| dc.title | Patterning of 25nm contact holes at 90nm pitch: combination of L/S double exposure immersion lithography and plasma-assisted shrink technology | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
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