Publication:
Progress towards an electrically active, ultra-shallow junction depth reference for carrier illumination, SRP and SIMS
Date
| dc.contributor.author | Borden, P. | |
| dc.contributor.author | Bechtler, L. | |
| dc.contributor.author | Klemme, B. | |
| dc.contributor.author | Nijmeijer, R. | |
| dc.contributor.author | Judge, E. | |
| dc.contributor.author | Diebold, A. | |
| dc.contributor.author | Bennett, J. | |
| dc.contributor.author | Vandervorst, Wilfried | |
| dc.contributor.author | Clarysse, Trudo | |
| dc.contributor.author | Caymax, Matty | |
| dc.contributor.author | Peytier, Ivan | |
| dc.contributor.imecauthor | Vandervorst, Wilfried | |
| dc.contributor.imecauthor | Caymax, Matty | |
| dc.date.accessioned | 2021-10-14T16:38:20Z | |
| dc.date.available | 2021-10-14T16:38:20Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2001 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5083 | |
| dc.source.beginpage | 161 | |
| dc.source.conference | 6th Int. Workshop on Fabrication, Characterization and Modeling of Ultra-Shallow Doping Profiles in Semiconductors - USJ | |
| dc.source.conferencedate | 22/04/2001 | |
| dc.source.conferencelocation | Napa, CA USA | |
| dc.source.endpage | 167 | |
| dc.title | Progress towards an electrically active, ultra-shallow junction depth reference for carrier illumination, SRP and SIMS | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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| Publication available in collections: |