Publication:

Transient clustering of reaction intermediates during wet etching of silicon nanostructures

Date

2017
Journal article
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dc.contributor.authorAabdin, Zainul
dc.contributor.authorXu, XiuMei
dc.contributor.authorSen, Soumyo
dc.contributor.authorAnand, Utkarsh
dc.contributor.authorKral, Petr
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorMirsaidov, Utkur
dc.contributor.imecauthorXu, XiuMei
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecXu, XiuMei::0000-0002-3356-8693
dc.date.accessioned2021-10-24T02:50:42Z
dc.date.available2021-10-24T02:50:42Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.issn1530-6984
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27689
dc.identifier.urlhttp://pubs.acs.org/doi/abs/10.1021/acs.nanolett.7b00196
dc.source.beginpage2953
dc.source.endpage2958
dc.source.issue5
dc.source.journalNano Letters
dc.source.volume7
dc.title

Transient clustering of reaction intermediates during wet etching of silicon nanostructures

dc.typeJournal article
dspace.entity.typePublication
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