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Zero-energy SIMS depth profiling: the role of surface roughness development with XeF2 based etching
Publication:
Zero-energy SIMS depth profiling: the role of surface roughness development with XeF2 based etching
Date
2011
Journal article
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18958.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vanhove, Nico
;
Lievens, Peter
;
Vandervorst, Wilfried
Journal
Surface and Interface Analysis
Abstract
Description
Metrics
Views
2004
since deposited on 2021-10-19
450
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations
Metrics
Views
2004
since deposited on 2021-10-19
450
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations