Zero-energy SIMS depth profiling: the role of surface roughness development with XeF2 based etching

dc.contributor.author	Vanhove, Nico
dc.contributor.author	Lievens, Peter
dc.contributor.author	Vandervorst, Wilfried
dc.contributor.imecauthor	Vandervorst, Wilfried
dc.date.accessioned	2021-10-19T20:50:49Z
dc.date.available	2021-10-19T20:50:49Z
dc.date.embargo	9999-12-31
dc.date.issued	2011
dc.identifier.issn	0142-2421
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/20037
dc.source.beginpage	159
dc.source.endpage	162
dc.source.issue	1_2
dc.source.journal	Surface and Interface Analysis
dc.source.volume	43
dc.title	Zero-energy SIMS depth profiling: the role of surface roughness development with XeF2 based etching
dc.type	Journal article
dspace.entity.type	Publication
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