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Design split and double exposure for contact hole printing at 0.40 k1 and beyond
Publication:
Design split and double exposure for contact hole printing at 0.40 k1 and beyond
Date
2004
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Köhler, Carsten
;
van Praagh, Judith
;
Finders, Jo
;
Wiaux, Vincent
;
Vandenberghe, Geert
Journal
Abstract
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1889
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
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Views
1889
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations