Publication:

Design split and double exposure for contact hole printing at 0.40 k1 and beyond

Date

2004
Proceedings Paper
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dc.contributor.authorKöhler, Carsten
dc.contributor.authorvan Praagh, Judith
dc.contributor.authorFinders, Jo
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVandenberghe, Geert
dc.date.accessioned2021-10-15T14:13:20Z
dc.date.available2021-10-15T14:13:20Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9140
dc.source.conferenceProceedings 41st Interface Symposium
dc.source.conferencedate26/09/2004
dc.source.conferencelocationTempe, AZ USA
dc.title

Design split and double exposure for contact hole printing at 0.40 k1 and beyond

dc.typeProceedings paper
dspace.entity.typePublication
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