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Single exposure EUV patterning optimization and defect inspection of hexagonal contact hole arrays using voltage contrast metrology
Publication:
Single exposure EUV patterning optimization and defect inspection of hexagonal contact hole arrays using voltage contrast metrology
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Date
2024
Proceedings Paper
https://doi.org/10.1117/12.3034189
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Das, Shubhankar
;
Blanco, Victor
;
Dey, Bappaditya
;
Liu, Xiang
;
Schelcher, Guillaume
;
De Simone, Danilo
Journal
Proceedings of SPIE
Abstract
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111
since deposited on 2025-05-11
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Acq. date: 2025-12-15
Citations
Metrics
Views
111
since deposited on 2025-05-11
1
last month
Acq. date: 2025-12-15
Citations