Publication:

Single exposure EUV patterning optimization and defect inspection of hexagonal contact hole arrays using voltage contrast metrology

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3034189
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dc.contributor.authorDas, Shubhankar
dc.contributor.authorBlanco, Victor
dc.contributor.authorDey, Bappaditya
dc.contributor.authorLiu, Xiang
dc.contributor.authorSchelcher, Guillaume
dc.contributor.authorDe Simone, Danilo
dc.contributor.imecauthorDas, Shubhankar
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorDey, Bappaditya
dc.contributor.imecauthorSchelcher, Guillaume
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecDas, Shubhankar::0000-0003-1830-1226
dc.contributor.orcidimecBlanco, Victor::0000-0003-4308-0381
dc.contributor.orcidimecDey, Bappaditya::0000-0002-0886-137X
dc.contributor.orcidimecSchelcher, Guillaume::0000-0003-3383-1049
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2025-07-07T08:45:34Z
dc.date.available2025-05-11T05:43:40Z
dc.date.available2025-07-07T08:45:34Z
dc.date.issued2024
dc.identifier.doi10.1117/12.3034189
dc.identifier.eisbn978-1-5106-8156-9
dc.identifier.isbn978-1-5106-8155-2
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45646
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 132150B
dc.source.conference2024 International Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 30-OCT 03, 2024
dc.source.conferencelocationMonterey
dc.source.endpageN/A
dc.source.journalProceedings of SPIE
dc.source.numberofpages11
dc.source.volume13215
dc.title

Single exposure EUV patterning optimization and defect inspection of hexagonal contact hole arrays using voltage contrast metrology

dc.typeProceedings paper
dspace.entity.typePublication
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