Publication:

Epitaxial CVD growth of ultra-thin Si passivation layers on strained Ge fin structures

Date

2018-02

Journal article

https://doi.org/10.1149/2.0191802jss

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Author(s)

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Arimura, Hiroaki

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Witters, Liesbeth

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Pourtois, Geoffrey

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Schulze, Andreas

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Douhard, Bastien

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Vanherle, Wendy

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Richard, Olivier

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Collaert, Nadine

Journal

ECS Journal of Solid State Science and Technology

Metrics

1923 since deposited on 2021-10-25

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Acq. date: 2025-12-15