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Line edge and width roughness mitigation at 22nm half pitch: plasma polymer interaction and roughness mitigation through etch
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1918 since deposited on 2021-10-21
3last week
Acq. date: 2025-10-29
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Metrics
Views
1918 since deposited on 2021-10-21
3last week
Acq. date: 2025-10-29
Citations