Publication:
Line edge and width roughness mitigation at 22nm half pitch: plasma polymer interaction and roughness mitigation through etch
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1922 since deposited on 2021-10-21
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Acq. date: 2026-04-26
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Statistics
Views
1922 since deposited on 2021-10-21
1last month
1last week
Acq. date: 2026-04-26
Citations