Publication:
Modeling of clustering reaction and diffusion of boron in strained Si1-xGex epitaxial layers
Date
| dc.contributor.author | Krishnasamy, Rajendran | |
| dc.contributor.author | Villaneuva, D. | |
| dc.contributor.author | Moens, P. | |
| dc.contributor.author | Schoenmaker, Wim | |
| dc.date.accessioned | 2021-10-15T05:14:36Z | |
| dc.date.available | 2021-10-15T05:14:36Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2003 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7758 | |
| dc.source.beginpage | 835 | |
| dc.source.endpage | 839 | |
| dc.source.issue | 5 | |
| dc.source.journal | Solid-State Electronics | |
| dc.source.volume | 47 | |
| dc.title | Modeling of clustering reaction and diffusion of boron in strained Si1-xGex epitaxial layers | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |