Publication:

Characterization and Reliability Study of an Al-Doped HfO2-Based High-Density 2.5-D MIMCAP

 
dc.contributor.authorChery, Emmanuel
dc.contributor.authorCroes, Kristof
dc.contributor.authorNolmans, Philip
dc.contributor.authorBeyne, Eric
dc.contributor.imecauthorChery, Emmanuel
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorNolmans, Philip
dc.contributor.imecauthorBeyne, Eric
dc.contributor.orcidimecChery, Emmanuel::0000-0002-2526-3873
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.contributor.orcidimecNolmans, Philip::0009-0009-3402-7627
dc.contributor.orcidimecBeyne, Eric::0000-0002-3096-050X
dc.date.accessioned2024-08-22T12:13:56Z
dc.date.available2024-04-26T18:05:30Z
dc.date.available2024-08-22T12:13:56Z
dc.date.issued2024
dc.identifier.doi10.1109/TED.2024.3386871
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43880
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
dc.source.beginpage3845
dc.source.endpage3851
dc.source.issue6
dc.source.journalIEEE TRANSACTIONS ON ELECTRON DEVICES
dc.source.numberofpages7
dc.source.volume71
dc.subject.keywordsTEMPERATURE-DEPENDENCE
dc.subject.keywordsHFO2
dc.subject.keywordsCAPACITORS
dc.subject.keywordsBREAKDOWN
dc.subject.keywordsDEPOSITION
dc.subject.keywordsREDUCTION
dc.subject.keywordsFILMS
dc.subject.keywordsTIN
dc.title

Characterization and Reliability Study of an Al-Doped HfO2-Based High-Density 2.5-D MIMCAP

dc.typeJournal article
dspace.entity.typePublication
Files
Publication available in collections: