Publication:

Improved plasma resistance for porous low-k dielectrics by pore stuffing approach

Date

2015
Journal article
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dc.contributor.authorZhang, Liping
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorHeyne, Markus
dc.contributor.authorNaumov, Sergej
dc.contributor.authorSun, Yiting
dc.contributor.authorZotovich, Alexey
dc.contributor.authorEl Otell, Ziad
dc.contributor.authorVaida, Selim
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorSun, Yiting
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-23T01:34:05Z
dc.date.available2021-10-23T01:34:05Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26240
dc.identifier.urlhttp://jss.ecsdl.org/content/4/1/N3098.abstract
dc.source.beginpageN3098
dc.source.endpageN3107
dc.source.issue1
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.volume4
dc.title

Improved plasma resistance for porous low-k dielectrics by pore stuffing approach

dc.typeJournal article
dspace.entity.typePublication
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