Publication:

LCDU optimization of STT-MRAM 50nm pitch MTJ pillars for process window improvement

Date

2019
Meeting abstract
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dc.contributor.authorPak, Murat
dc.contributor.authorCrotti, Davide
dc.contributor.authorYasin, Farrukh
dc.contributor.authorErcken, Monique
dc.contributor.authorHalder, Sandip
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVanelderen, Pieter
dc.contributor.authorSouriau, Laurent
dc.contributor.authorHody, Hubert
dc.contributor.authorKar, Gouri Sankar
dc.contributor.imecauthorPak, Murat
dc.contributor.imecauthorCrotti, Davide
dc.contributor.imecauthorYasin, Farrukh
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVanelderen, Pieter
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorHody, Hubert
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.orcidimecYasin, Farrukh::0000-0002-7295-0254
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.date.accessioned2021-10-27T15:18:34Z
dc.date.available2021-10-27T15:18:34Z
dc.date.embargo9999-12-31
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33722
dc.identifier.urlhttps://doi.org/10.1117/12.2515023
dc.source.beginpage109570R
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography X
dc.source.conferencedate24/02/2019
dc.source.conferencelocationSan Jose, CA USA
dc.title

LCDU optimization of STT-MRAM 50nm pitch MTJ pillars for process window improvement

dc.typeMeeting abstract
dspace.entity.typePublication
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