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Detection of split design-related weak points in double patterning using PQW and bright-field defect inspection

Date

2008
Proceedings Paper
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dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorCheng, Shaunee
dc.contributor.authorLeray, Philippe
dc.contributor.authorWiaux, Vincent
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorD'have, Koen
dc.contributor.authorJaenen, Patrick
dc.contributor.authorMarcuccilli, Gino
dc.contributor.authorMalik, Irfan
dc.contributor.authorKlein, Sophie
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorD'have, Koen
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.orcidimecD'have, Koen::0000-0002-5195-9241
dc.date.accessioned2021-10-17T11:42:48Z
dc.date.available2021-10-17T11:42:48Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14627
dc.source.conference5th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/09/2008
dc.source.conferencelocationDen Haag Nederland
dc.title

Detection of split design-related weak points in double patterning using PQW and bright-field defect inspection

dc.typeProceedings paper
dspace.entity.typePublication
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