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Laser thermal anneal of polysilicon channel to boost 3D memory performance

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dc.contributor.authorLisoni, Judit
dc.contributor.authorArreghini, Antonio
dc.contributor.authorCongedo, Gabriele
dc.contributor.authorToledano Luque, Maria
dc.contributor.authorToqué-Trésonne, Inès
dc.contributor.authorHuet, Karim
dc.contributor.authorCapogreco, Elena
dc.contributor.authorLiu, Lifang
dc.contributor.authorTan, Chi Lim
dc.contributor.authorDegraeve, Robin
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorVan Houdt, Jan
dc.contributor.imecauthorArreghini, Antonio
dc.contributor.imecauthorCapogreco, Elena
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecArreghini, Antonio::0000-0002-7493-9681
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.date.accessioned2021-10-22T03:08:46Z
dc.date.available2021-10-22T03:08:46Z
dc.date.embargo9999-12-31
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24147
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=6894346&contentType=Conference+Publications
dc.source.beginpage24
dc.source.conferenceSymposium on VLSI Technology
dc.source.conferencedate9/04/2014
dc.source.conferencelocationHonolulu, HI US
dc.source.endpage25
dc.title

Laser thermal anneal of polysilicon channel to boost 3D memory performance

dc.typeProceedings paper
dspace.entity.typePublication
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