Publication:
Extreme scaled gate dielectrics by using ALD Hf-based composite materials
Date
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-1057-8140 | |
| cris.virtual.orcid | 0000-0001-7547-7194 | |
| cris.virtual.orcid | 0000-0003-1533-7055 | |
| cris.virtual.orcid | 0000-0002-4831-3159 | |
| cris.virtualsource.department | ee7e6e4c-3b87-41b4-9995-a519c69c638e | |
| cris.virtualsource.department | 5afcb429-ac38-4c13-8422-3088287ba9bd | |
| cris.virtualsource.department | 2fc65eb2-c2f1-4505-bb09-96f2d0aa6ce9 | |
| cris.virtualsource.department | 3e839b18-b9e5-46f9-95d4-760837031f7a | |
| cris.virtualsource.orcid | ee7e6e4c-3b87-41b4-9995-a519c69c638e | |
| cris.virtualsource.orcid | 5afcb429-ac38-4c13-8422-3088287ba9bd | |
| cris.virtualsource.orcid | 2fc65eb2-c2f1-4505-bb09-96f2d0aa6ce9 | |
| cris.virtualsource.orcid | 3e839b18-b9e5-46f9-95d4-760837031f7a | |
| dc.contributor.author | Pierreux, Dieter | |
| dc.contributor.author | Machkaoutsan, Vladimir | |
| dc.contributor.author | Tois, E. | |
| dc.contributor.author | Swerts, Johan | |
| dc.contributor.author | Schram, Tom | |
| dc.contributor.author | Adelmann, Christoph | |
| dc.contributor.author | Van Elshocht, Sven | |
| dc.contributor.author | Tseng, Joshua | |
| dc.contributor.author | Ragnarsson, Lars-Ake | |
| dc.contributor.author | Maes, Jan | |
| dc.contributor.imecauthor | Pierreux, Dieter | |
| dc.contributor.imecauthor | Machkaoutsan, Vladimir | |
| dc.contributor.imecauthor | Swerts, Johan | |
| dc.contributor.imecauthor | Schram, Tom | |
| dc.contributor.imecauthor | Adelmann, Christoph | |
| dc.contributor.imecauthor | Van Elshocht, Sven | |
| dc.contributor.imecauthor | Ragnarsson, Lars-Ake | |
| dc.contributor.imecauthor | Maes, Jan | |
| dc.contributor.orcidimec | Adelmann, Christoph::0000-0002-4831-3159 | |
| dc.contributor.orcidimec | Van Elshocht, Sven::0000-0002-6512-1909 | |
| dc.contributor.orcidimec | Ragnarsson, Lars-Ake::0000-0003-1057-8140 | |
| dc.date.accessioned | 2021-10-18T01:43:11Z | |
| dc.date.available | 2021-10-18T01:43:11Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2009 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16019 | |
| dc.source.beginpage | 2037 | |
| dc.source.conference | 216th ECS Meeting | |
| dc.source.conferencedate | 4/10/2009 | |
| dc.source.conferencelocation | Vienna Austria | |
| dc.title | Extreme scaled gate dielectrics by using ALD Hf-based composite materials | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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| Publication available in collections: |