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Conference contributions
Contact edge roughness and CD uniformity in EUV: effect of photo acid generator and sensitizer
Publication:
Contact edge roughness and CD uniformity in EUV: effect of photo acid generator and sensitizer
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Date
2012
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24657.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kuppuswamy, Vijaya-Kumar Murugesan
;
Constantoudis, Vassilios
;
Gogolides, Evangelos
;
Vaglio Pret, Alessandro
;
Gronheid, Roel
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Views
1893
since deposited on 2021-10-20
1
last month
1
last week
Acq. date: 2025-12-10
Citations