Contact edge roughness and CD uniformity in EUV: effect of photo acid generator and sensitizer

dc.contributor.author	Kuppuswamy, Vijaya-Kumar Murugesan
dc.contributor.author	Constantoudis, Vassilios
dc.contributor.author	Gogolides, Evangelos
dc.contributor.author	Vaglio Pret, Alessandro
dc.contributor.author	Gronheid, Roel
dc.contributor.imecauthor	Vaglio Pret, Alessandro
dc.contributor.imecauthor	Gronheid, Roel
dc.date.accessioned	2021-10-20T12:26:56Z
dc.date.available	2021-10-20T12:26:56Z
dc.date.embargo	9999-12-31
dc.date.issued	2012
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/20968
dc.source.beginpage	832207
dc.source.conference	Extreme Ultraviolet (EUV) Lithography III
dc.source.conferencedate	12/02/2012
dc.source.conferencelocation	San Jose, CA USA
dc.title	Contact edge roughness and CD uniformity in EUV: effect of photo acid generator and sensitizer
dc.type	Proceedings paper
dspace.entity.type	Publication
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