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Superior N- and PMOSFET scalability using carbon co-implantation and spike annealing

Date

2007
Journal article
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dc.contributor.authorAugendre, E.
dc.contributor.authorPawlak, Bartek
dc.contributor.authorKubicek, Stefan
dc.contributor.authorHoffmann, Thomas
dc.contributor.authorChiarella, Thomas
dc.contributor.authorKerner, Christoph
dc.contributor.authorSeveri, Simone
dc.contributor.authorFalepin, Annelies
dc.contributor.authorRamos, Emilio
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorEyben, Pierre
dc.contributor.authorVanhaeren, Danielle
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorJurczak, Gosia
dc.contributor.authorAbsil, Philippe
dc.contributor.authorBiesemans, Serge
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorKerner, Christoph
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorFalepin, Annelies
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVanhaeren, Danielle
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.contributor.orcidimecVanhaeren, Danielle::0000-0001-8624-9533
dc.date.accessioned2021-10-16T15:01:04Z
dc.date.available2021-10-16T15:01:04Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11662
dc.source.beginpage1432
dc.source.endpage1436
dc.source.issue11_12
dc.source.journalSolid-State Electronics
dc.source.volume51
dc.title

Superior N- and PMOSFET scalability using carbon co-implantation and spike annealing

dc.typeJournal article
dspace.entity.typePublication
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