Publication:

Study of metal barrier deposition-induced damage to porous low-k materials

Date

2011
Journal article
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dc.contributor.authorZhao, Larry
dc.contributor.authorVolders, Henny
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorTokei, Zsolt
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorWilson, Chris
dc.contributor.authorVan Besien, Els
dc.contributor.authorBeyer, Gerald
dc.contributor.authorClaeys, Cor
dc.contributor.imecauthorVolders, Henny
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorVan Besien, Els
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecVan Besien, Els::0000-0002-5174-2229
dc.date.accessioned2021-10-19T22:28:14Z
dc.date.available2021-10-19T22:28:14Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20224
dc.source.beginpage3030
dc.source.endpage3034
dc.source.issue9
dc.source.journalMicroelectronic Engineering
dc.source.volume88
dc.title

Study of metal barrier deposition-induced damage to porous low-k materials

dc.typeJournal article
dspace.entity.typePublication
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