Publication:
Sub-20nm gate length p-FinFETs device performance improvement using TEM/EDX and NBD based TCAD calibrations.
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221 since deposited on 2023-07-18
3last month
Acq. date: 2025-12-17
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Metrics
Views
221 since deposited on 2023-07-18
3last month
Acq. date: 2025-12-17
Citations