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Effective reduction of interfacial traps in Al2O3 /GaAs(001) gate stacks using surface engineering and thermal annealing
Publication:
Effective reduction of interfacial traps in Al2O3 /GaAs(001) gate stacks using surface engineering and thermal annealing
Date
2010
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Chang, Yao-Chung
;
Merckling, Clement
;
Penaud, Julien
;
Lu, Chung-Yu
;
Wang, Wei-E
;
Dekoster, Johan
;
Meuris, Marc
;
Caymax, Matty
;
Heyns, Marc
;
Kwo, Raynien
;
Hong, Minghwei
Journal
Applied Physics Letters
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1906
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations
Metrics
Views
1906
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations