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Articles
Scaling and readiness of underlayers for high-numerical aperture extreme ultraviolet lithography
Publication:
Scaling and readiness of underlayers for high-numerical aperture extreme ultraviolet lithography
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Date
2022
Journal article
https://doi.org/10.1117/1.JMM.21.4.044601
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3.11 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Fallica, Roberto
;
De Simone, Danilo
;
Chen, Steven
;
Safdar, Muhammad
;
Suh, Hyo Seon
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
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Downloads
290
since deposited on 2023-03-01
37
last month
12
last week
Acq. date: 2025-12-15
Views
1404
since deposited on 2023-03-01
3
last month
Acq. date: 2025-12-15
Citations