Publication:

Scaling and readiness of underlayers for high-numerical aperture extreme ultraviolet lithography

Date

2022
Journal article
https://doi.org/10.1117/1.JMM.21.4.044601
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dc.contributor.authorFallica, Roberto
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorChen, Steven
dc.contributor.authorSafdar, Muhammad
dc.contributor.authorSuh, Hyo Seon
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorChen, Steven
dc.contributor.imecauthorSafdar, Muhammad
dc.contributor.imecauthorSuh, Hyo Seon
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2023-03-23T10:29:16Z
dc.date.available2023-03-01T03:27:52Z
dc.date.available2023-03-05T10:01:08Z
dc.date.available2023-03-23T10:29:16Z
dc.date.embargo2022-11-15
dc.date.issued2022
dc.identifier.doi10.1117/1.JMM.21.4.044601
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41206
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpage044601
dc.source.endpagena
dc.source.issue4
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages14
dc.source.volume21
dc.subject.disciplineMaterials science
dc.subject.keywordsextreme ultraviolet; extreme ultraviolet lithography; high-numerical aperture; underlayer; photoresist; scaling; numerical aperture; lithography
dc.subject.keywordsEUV
dc.title

Scaling and readiness of underlayers for high-numerical aperture extreme ultraviolet lithography

dc.typeJournal article
dspace.entity.typePublication
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