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Challenges on surface conditioning in 3D device architectures: triple-gate FinFETs, gate-all-around lateral and vertical nanowire FETs

Date

2017
Proceedings Paper
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dc.contributor.authorVeloso, Anabela
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorVecchio, Emma
dc.contributor.authorDevriendt, Katia
dc.contributor.authorLi, Waikin
dc.contributor.authorSimoen, Eddy
dc.contributor.authorChan, BT
dc.contributor.authorTao, Zheng
dc.contributor.authorRosseel, Erik
dc.contributor.authorLoo, Roger
dc.contributor.authorMilenin, Alexey
dc.contributor.authorKunert, Bernardette
dc.contributor.authorTeugels, Lieve
dc.contributor.authorSebaai, Farid
dc.contributor.authorLorant, Christophe
dc.contributor.authorvan Dorp, Dennis
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorBrus, Stephan
dc.contributor.authorMarien, Philippe
dc.contributor.authorFleischmann, Claudia
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorVecchio, Emma
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorLi, Waikin
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorKunert, Bernardette
dc.contributor.imecauthorTeugels, Lieve
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorLorant, Christophe
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorMarien, Philippe
dc.contributor.imecauthorFleischmann, Claudia
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecKunert, Bernardette::0000-0002-8986-4109
dc.contributor.orcidimecTeugels, Lieve::0000-0002-6613-9414
dc.contributor.orcidimecLorant, Christophe::0000-0001-7363-9348
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.contributor.orcidimecFleischmann, Claudia::0000-0003-1531-6916
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecHellings, Geert::0000-0002-5376-2119
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.accessioned2021-10-24T17:31:44Z
dc.date.available2021-10-24T17:31:44Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29811
dc.identifier.urlhttp://ecst.ecsdl.org/content/80/2/3.abstract
dc.source.beginpage3
dc.source.conference232nd ECS Fall Meeting - 15th International Symposium on Semiconductor Cleaning Science and Technology - SCST15
dc.source.conferencedate1/10/2017
dc.source.conferencelocationNational Harbor, MD USA
dc.source.endpage20
dc.title

Challenges on surface conditioning in 3D device architectures: triple-gate FinFETs, gate-all-around lateral and vertical nanowire FETs

dc.typeProceedings paper
dspace.entity.typePublication
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