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Through pitch low-k1 contact hole imaging with CPL(TM) technology
Publication:
Through pitch low-k1 contact hole imaging with CPL(TM) technology
Date
2004
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wiaux, Vincent
;
Bekaert, Joost
;
Ronse, Kurt
;
Vandenberghe, Geert
;
Fung Chen, J.
;
Hsu, Stephen
;
Van Den Broeke, Douglas
;
Socha, Robert
Journal
Photomask, BACUS News
Abstract
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Views
1966
since deposited on 2021-10-15
422
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations
Metrics
Views
1966
since deposited on 2021-10-15
422
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations