Publication:

Through pitch low-k1 contact hole imaging with CPL(TM) technology

Date

2004
Journal article
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dc.contributor.authorWiaux, Vincent
dc.contributor.authorBekaert, Joost
dc.contributor.authorRonse, Kurt
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorFung Chen, J.
dc.contributor.authorHsu, Stephen
dc.contributor.authorVan Den Broeke, Douglas
dc.contributor.authorSocha, Robert
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-15T17:55:14Z
dc.date.available2021-10-15T17:55:14Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9918
dc.source.beginpage1
dc.source.endpage11
dc.source.issue12
dc.source.journalPhotomask, BACUS News
dc.source.volume20
dc.title

Through pitch low-k1 contact hole imaging with CPL(TM) technology

dc.typeJournal article
dspace.entity.typePublication
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