Publication:

Observation of negative mask error enhancement factor due to mask transmission resonance

Date

2008
Journal article
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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0002-8297-5076
cris.virtual.orcid0000-0002-2959-432X
cris.virtualsource.departmentbf23291b-8cd7-495b-b210-564de11c9d4f
cris.virtualsource.department0ed0ad17-0b15-4c84-b55a-e2d02d830fa8
cris.virtualsource.orcidbf23291b-8cd7-495b-b210-564de11c9d4f
cris.virtualsource.orcid0ed0ad17-0b15-4c84-b55a-e2d02d830fa8
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorMesuda, Kei
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2021-10-17T09:51:05Z
dc.date.available2021-10-17T09:51:05Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14315
dc.source.beginpage20501
dc.source.issue2
dc.source.journalJournal of Micro/Nanolithography, MEMS, and MOEMS
dc.source.volume7
dc.title

Observation of negative mask error enhancement factor due to mask transmission resonance

dc.typeJournal article
dspace.entity.typePublication
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