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Impact of TiN metal gate thickness and the HfSiO nitridation on MuGFETs electrical performance
Publication:
Impact of TiN metal gate thickness and the HfSiO nitridation on MuGFETs electrical performance
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Date
2009
Proceedings Paper
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18108.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Rodrigues, Michele
;
Mercha, Abdelkarim
;
Simoen, Eddy
;
Collaert, Nadine
;
Claeys, Cor
;
Martino, J.A.
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1839
since deposited on 2021-10-18
Acq. date: 2025-12-12
Citations
Metrics
Views
1839
since deposited on 2021-10-18
Acq. date: 2025-12-12
Citations