Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
A new paradigm for in-line detection and control of patterning defects
Publication:
A new paradigm for in-line detection and control of patterning defects
Date
2015
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hunsche, Stefan
;
Jochemsen, Marinus
;
Jain, Vivek
;
Zhou, Xinjian
;
Chen, Frank
;
Vellanki, Venu
;
Spence, Chris
;
Halder, Sandip
;
Van Den Heuvel, Dieter
;
Truffert, Vincent
Journal
Abstract
Description
Metrics
Views
1943
since deposited on 2021-10-22
409
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations
Metrics
Views
1943
since deposited on 2021-10-22
409
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations