Publication:

A new paradigm for in-line detection and control of patterning defects

Date

2015
Proceedings Paper
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dc.contributor.authorHunsche, Stefan
dc.contributor.authorJochemsen, Marinus
dc.contributor.authorJain, Vivek
dc.contributor.authorZhou, Xinjian
dc.contributor.authorChen, Frank
dc.contributor.authorVellanki, Venu
dc.contributor.authorSpence, Chris
dc.contributor.authorHalder, Sandip
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorTruffert, Vincent
dc.contributor.imecauthorJochemsen, Marinus
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.date.accessioned2021-10-22T19:47:38Z
dc.date.available2021-10-22T19:47:38Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25404
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2210980
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXIX
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.title

A new paradigm for in-line detection and control of patterning defects

dc.typeProceedings paper
dspace.entity.typePublication
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