Publication:

Line profile measurement of advanced-FinFET features by reference metrology

Date

2015
Proceedings Paper
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dc.contributor.authorTakamasu, Kiyoshi
dc.contributor.authorIwaki, Y.
dc.contributor.authorTakahashi, S.
dc.contributor.authorKawada, H.
dc.contributor.authorIkota, M.
dc.contributor.authorYamaguchu, A.
dc.contributor.authorLorusso, Gian
dc.contributor.authorHoriguchi, Naoto
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-22T23:26:14Z
dc.date.available2021-10-22T23:26:14Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25979
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2210945&resultClick=1
dc.source.beginpage942406
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXIX
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.title

Line profile measurement of advanced-FinFET features by reference metrology

dc.typeProceedings paper
dspace.entity.typePublication
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