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Assessing the performance of two and three dimensional dopant profiling techniques for sub-65nm technologies
Publication:
Assessing the performance of two and three dimensional dopant profiling techniques for sub-65nm technologies
Date
2007
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Eyben, Pierre
;
Mody, Jay
;
Vemula, Sri Charan
;
Koelling, Sebastian
;
Verheyden, R.
;
Vandervorst, Wilfried
;
Raineri, V.
;
Giannazzo, F.
;
Verheijen, M.
;
Kim, D.H.
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1949
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1949
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations