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Assessing the performance of two and three dimensional dopant profiling techniques for sub-65nm technologies

Date

2007
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dc.contributor.authorEyben, Pierre
dc.contributor.authorMody, Jay
dc.contributor.authorVemula, Sri Charan
dc.contributor.authorKoelling, Sebastian
dc.contributor.authorVerheyden, R.
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorRaineri, V.
dc.contributor.authorGiannazzo, F.
dc.contributor.authorVerheijen, M.
dc.contributor.authorKim, D.H.
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-16T16:04:05Z
dc.date.available2021-10-16T16:04:05Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12139
dc.source.conferenceInternational Workshop on INSIGHT in Semiconductor Device Fabrication, Metrology, and Modeling
dc.source.conferencedate6/05/2007
dc.source.conferencelocationNapa, CA USA
dc.title

Assessing the performance of two and three dimensional dopant profiling techniques for sub-65nm technologies

dc.typeOral presentation
dspace.entity.typePublication
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